# Precise Fermi level engineering in a topological Weyl semimetal via fast ion implantation

**URL:** https://community.materialssquare.com/t/precise-fermi-level-engineering-in-a-topological-weyl-semimetal-via-fast-ion-implantation/676
**Category:** News
**Created:** [September 23, 2024, 8:08pm UTC](https://community.materialssquare.com/t/precise-fermi-level-engineering-in-a-topological-weyl-semimetal-via-fast-ion-implantation/676 "2024-09-23T20:08:14Z")
**Posts on this page:** 1
**Page:** 1

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### Author: ![gabriele1](https://yyz1.discourse-cdn.com/flex003/user_avatar/community.materialssquare.com/gabriele1/32/20_2.png) [@gabriele1](https://community.materialssquare.com/u/gabriele1)
#### Post date: [September 23, 2024, 8:08pm UTC](https://community.materialssquare.com/t/precise-fermi-level-engineering-in-a-topological-weyl-semimetal-via-fast-ion-implantation/676/1 "2024-09-23T20:08:14Z")

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This article describes how precise Fermi level engineering in the topological Weyl semimetal tantalum phosphide (TaP) was achieved using fast ion implantation. By adjusting hydrogen ion implantation, researchers fine-tuned the Fermi level to within millielectronvolts (meV) of the Weyl nodes, preserving the semimetal’s properties. This method maintains crystalline integrity and carrier mobility while enhancing control over quantum properties, making it a promising technique for future quantum materials.

For more details, you can access the full article here:

> **[Precise Fermi level engineering in a topological Weyl semimetal via fast ion...](https://pubs.aip.org/aip/apr/article/11/2/021429/3299347/Precise-Fermi-level-engineering-in-a-topological)**
>
> The precise controllability of the Fermi level is a critical aspect of quantum materials. For topological Weyl semimetals, there is a pressing need to fine-tune