MIT researchers have developed a precise method to fine-tune quantum materials, particularly Weyl semimetals, by adjusting their Fermi level through a process called ion implantation. This method uses a two-stage ion accelerator to introduce hydrogen ions, enabling milli-electron volt accuracy. This fine-tuning could enhance material properties such as superconductivity and thermoelectric efficiency, with potential applications in quantum computing and microelectronics. The approach offers faster and more accurate control compared to traditional methods.
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